Semiconductor fabrication processes and device manufacturing are fundamental to the advancement and production of modern semiconductor technologies.
This course begins with the basic principles of semiconductor wafer cleaning, including both wet and dry cleaning processes as well as contamination control technologies. It then introduces semiconductor isolation techniques, covering their fundamental concepts, historical development, and technological evolution.
Through this course, learners will gain a foundational understanding of critical semiconductor fabrication processes and the technologies that enable the reliable manufacturing of advanced semiconductor devices.
Upon completing this course, students will develop a fundamental understanding of semiconductor wafer cleaning technologies and isolation techniques, including the following key concepts:
Professor Tien-Sheng Chao is currently a faculty member of the Department of Electrophysics at National Yang Ming Chiao Tung University. He received his Ph.D. degree from the Institute of Electronics, National Chiao Tung University, in 1992. With over 30 years of experience in semiconductor education and research, Professor Chao has made significant contributions to the fields of semiconductor device technology and fabrication processes.
The course is organized into several modules, each consisting of short lessons.
Each lesson is presented as a video of approximately 10–30 minutes, allowing learners to study at their own pace.
A quiz is provided after each major topic to help learners assess their understanding of the course content.
This course is designed primarily for third-year undergraduate students or above majoring in Electrical Engineering, Electronics Engineering, or related disciplines.
Students are recommended to have a basic understanding of the following subjects before taking this course: